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Spin Cleaner (Wafer Mask Cleaner) |
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Product Overview
Our spin cleaner features absolutely no dripping over substrates upon lid opening, customizable RPM: 6,000;8,000;12,000rpm, high profile AC Servo Motor instead of DC Motor, and new generation of PAC.
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Spin Cleaner
| Suitable Size |
2"-12" Wafer |
Spin Cleaner
Application |
- Developing Process
- Etching Process
- Stripping Process
- Cleaning Process
- Mask Cleaner
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| Operation Mode |
Auto / Semi-Auto / Manual |
| Product Type |
Wet Bench or Wet station |
| Product Feature |
- Use quality pipe and valve component
- Use PAC for electronic controller
- Robotic horizontal and vertical stroke for high accuracy, stability and positioning
- Quarantine zone for both acidic gas and electrical substance
- Flexible disposition scheme for QDR
- Modularized pipeline installment allows swift and convenient maintenance
- Product design is highly adaptable to fit in customized environment according to the actual needs
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| Available Options |
- Class 100 or 1000
- CIM Connect
- Chemical Supply System
- CO2 / IR
- PLC / PC Base / PAC
- Datalogic
- Temperature Measurement Data Acquisition System
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